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金屬代替柵工藝流程 ? ? ???? 英文回答: ? ? ????Metal?replacement?gate?(MRG)?technology?is?an?advanced? process?used?in?semiconductor?manufacturing?to?replace?the? traditional?polysilicon?gate?with?a?metal?gate.?This? technology?offers?several?advantages?over?the?conventional? polysilicon?gate,?including?improved?performance?and? reduced?power?consumption.? ? ????The?process?flow?of?metal?replacement?gate?technology? involves?several?steps.?First,?a?high-k?dielectric?layer?is? deposited?on?the?silicon?substrate.?This?dielectric?layer? acts?as?an?insulator?and?helps?to?improve?the?gate? capacitance.?Next,?a?metal?layer,?typically?composed?of?a? refractory?metal?such?as?tungsten?or?titanium,?is?deposited? on?top?of?the?dielectric?layer.?This?metal?layer?serves?as? the?gate?electrode.? ? ????After?the?metal?layer?deposition,?a?patterning?step?is? |
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